자연과학대학 - 물리학과

  • 교수 반도체표면물리실험
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관심분야

Research on characteristics of materials and devices related with semiconductor, display and biointerface.

학력

  • (PhD) 1988 ∼ 1993 In physics. North Carolina State University, USA

약력/경력

  • 2005 ∼ present Sungkyunkwan University, Professor
  • 1999 ∼ 2005 Sungkyunkwan University , Associate Professor
  • 1995 ∼ 1999 Sungkyunkwan University , Assistant Professor
  • 1993 ∼ 1995 Samsung Advanced Institute of Technology, Senior Researcher
  • 1995 ∼ present The Korean Physical Society Member
  • 1995 ∼ present The Korean Vacuum Society Member

학술지 논문

  • (2023)  Change in Electrical/Mechanical Properties of Plasma Polymerized Low Dielectric Constant Films after Etching in CF4/O2 Plasma for Semiconductor Multilevel Interconnects.  MATERIALS.  16,  13
  • (2023)  Inner surface modification of polyurethane ureteral stents using plasma-enhanced chemical vapor deposition to improve the resistance to encrustation in a pig model.  INVESTIGATIVE AND CLINICAL UROLOGY.  64,  2
  • (2022)  Reduction time effect on the dielectric characteristics of reduced-graphene-oxide--encapsulated barium titanate powder fillers.  CARBON.  199,  1
  • (2022)  Etching characteristics of low-k SiCOH thin films under fluorocarbon-based plasmas.  Vacuum.  202,  1
  • (2022)  Enhancement of dielectric performance of encapsulation in barium titanate oxide using size-controlled reduced graphene oxide.  RSC ADVANCES.  12,  26
  • (2022)  Inner surface modification of ureteral stent polyurethane tubes based by plasma-enhanced chemical vapor deposition to reduce encrustation and biofilm formation.  BIOFOULING.  38,  5
  • (2021)  Plasma Polymerized SiCOH Films from Octamethylcyclotetrasiloxane by Dual Radio Frequency Inductively Coupled Plasma Chemical Vapor Deposition System.  Journal of Nanoscience and Nanotechnology.  21,  8
  • (2021)  Study on Effects of Carrier Gas Flow Rate on Properties of Low Dielectric Constant Film Deposited by Plasma Enhanced Chemical Vapor Deposition Using the Octamethylcyclotetrasiloxane Precursor.  Journal of Nanoscience and Nanotechnology.  21,  8
  • (2021)  Enhanced culturing of adipose derived mesenchymal stem cells on surface modified polystyrene Petri dishes fabricated by plasma enhanced chemical vapor deposition system.  JOURNAL OF BIOMEDICAL MATERIALS RESEARCH PART B-APPLIED BIOMATERIALS.  110,  2
  • (2021)  Ultralow dielectric constant SiCOH films by plasma enhanced chemical vapor deposition of decamethylcyclopentasiloxane and tetrakis(trimethylsilyloxy)silane precursors.  THIN SOLID FILMS.  727,  1
  • (2021)  Characterization of Flexible Low-k Dielectric SiCOH Films Prepared by Plasma-Enhanced Chemical Vapor Deposition of Tetrakis(trimethylsilyloxy)Silane Precursor.  JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY.  21,  4
  • (2020)  One-step fabrication method of non-fouling amine-functionalized polyethylene glycol thin film using a single precursor through plasma-enhanced chemical vapor deposition.  SURFACE & COATINGS TECHNOLOGY.  403, 
  • (2020)  Dielectric characteristics of graphene-encapsulated barium titanate polymer composites.  MATERIALS CHEMISTRY AND PHYSICS.  255, 
  • (2020)  Dielectric characteristics of graphene-encapsulated barium titanate polymer composites..  MATERIALS CHEMISTRY AND PHYSICS.  255,  -
  • (2020)  Characterization of Bilayer Organic Solar Cells with Carbon Nanotubes Using Impedance Analysis.  JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY.  20,  11
  • (2020)  Effects of He/H(2)( )Plasma Treatment on Properties o f SiCOH Films Deposited with the 1,1 1,3,5,7,7,7-Octamethyl-3,5-Bis(Trimethylsiloxy) Tetrasiloxane Precursor.  JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY.  20,  11
  • (2020)  Epitaxial strain dependent electrocatalytic activity in CaRuO3 thin films.  APPLIED PHYSICS LETTERS.  117,  16
  • (2020)  Surface modification of polystyrene Petri dishes by plasma polymerized 4,7,10-trioxa-1,13-tridecanediamine for enhanced culturing and migration of bovine aortic endothelial cells.  BIOFOULING.  36,  7
  • (2020)  Effect of plasma power on properties of hydrogenated amorphous silicon carbide hardmask films deposited by PECVD.  VACUUM.  174, 
  • (2020)  Low-k SiCOH Films Deposited with a Single Precursor 1,1,1,3,5,7,7,7 Octamethyl-3,5-Bis(trimethylsiloxy) Tetrasiloxane by Plasma Enhanced Chemical Vapor Deposition.  JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY.  20,  4

단행본

  • (2002)  대학물리학.  북스힐.  공동
  • (2001)  일반물리학실험.  성대 출판부.  공동

특허/프로그램

  • 줄기세포 배양용 기판의 제조방법.  10-2017-0079013.  20190610.  대한민국
  • 탄소, 산소, 및 금속을 포함하는 금속탄화산화물 박막 및 그의 제조방법.  10-2015-0159154.  20180109.  대한민국
  • 산소 및/또는 수분 차단용 다층 박막.  10-2015-0023297.  20170821.  대한민국
  • Method of Manufacturing Patterned Substrate for Culturing Cells, Patterned Substrate for Culturing Cells, Patterning Method of Culturing Cells, and Patterned Cell Chip.  14/634,190.  20170228.  미국
  • A TUBE WITH MODIFIED INNER WALL SURFACE USING PLASMA AND A PREPARATION METHOD THEREOF.  US14/167,251.  20170223.  미국
  • A POROUS FILM WITH HIGH HARDNESS AND A LOW DIELECTRIC CONSTANT AND PREPARATION METHOD THEREOF.  14/825,823.  20160621.  미국
  • 유기전자소자용 폴리머/무기 다층 박막 봉지.  10-2014-0017311.  20150716.  대한민국
  • 고강도 저유전 플라즈마 중합체 박막 및 그 제조방법.  10-2013-0098177.  20150323.  대한민국
  • 플라즈마를 이용하여 내부표면이 개질된 튜브 및 이의 제조방법.  10-2013-0024725.  20150112.  대한민국
  • 패턴화된 세포배양용 기판의 제조방법, 패턴화된 세포 배양용 기판 및 세포칩.  10-2013-0025350.  20141111.  대한민국
  • 유기전자소자용 폴리머/무기 다층 박막 봉지.  10-2013-0122884.  20140418.  대한민국
  • 저유전 플라즈마 중합체 박막 및 그 제조방법.  200810182570.1.  20120509.  중국
  • 저유전 플라즈마 중합체 박막 및 그 제조 방법.  EP08170636.  20120502.  EU연합
  • 세포 고정화용 기판의 제조방법, 세포 고정화용 기판, 세포의 고정 방법, 및 세포칩 (METHOD OF MANUFACTURING SUBSTRATE FOR FIXING CELLS, SUBSTRATE FOR FIXING CELLS, METHOD OF FIXING CELLS, AND CELL CHIP).  10-2010-7021614.  20120326.  대한민국
  • 패턴화된 세포 고정화용 기판의 제조방법, 패턴화된 세포 고정화용 기판, 세포의 패턴화된 배양 방법, 및 패턴화된 세포칩.  10-2009-0082152.  20120314.  대한민국
  • 유기태양전지 및 그 제조방법.  10-2009-0011605.  20110701.  대한민국
  • 저유전 플라즈마 중합체 박막 및 그 제조 방법 (PLASMA POLYMERIZED THIN FILM AND MANUFACTURING METHOD THEREOF).  2010-0005202.  20101005.  대한민국
  • 플라즈마를 이용한 단백질 칩 기판의 제조방법 및 이로부터 제조된 단백질 칩 기판.  11/616,483.  20100831.  미국
  • 플라즈마를 이용한 단백질칩 기판의 제조방법 및 이로부터 제조된 단백질칩 기판.  2006-353470.  20100611.  일본
  • 저유전 플라즈마 중합체 박막 및 그 제조 방법.  2007-0126331.  20100531.  대한민국

학술회의논문

  • (2023)  Characteristics of Carbon-rich SiCN Films Used as Dielectric Cu Diffusion  Barrier Deposited by PECVD Using The 1-(Trimethylsilyl)pyrrolidine  Precursor for Semiconductor Multilevel Metallization.  한국반도체학회.  대한민국
  • (2022)  Inner surface modfication of polyurethane ureteral stent using plsma-enhanced chemical vapor deposition for impoved resistance to encrustation in a pig model.  제29차 대한비뇨내시경로봇학회.  대한민국
  • (2022)  Effects of N2 gas flow rates on properties of Cu diffusion barrier SiCN films deposited by PECVD using the 1-(Trimethylsilyl)Pyrrolidine Precursor 1.  2022년도 전기물성․응용부문회 추계학술대회.  대한민국
  • (2022)  Cu diffusion Barrier Characteristics of Carbon Rich SiCN Films Deposited by PECVD Using the 1-(Trimethylsilyl)Pyrrolidine Precursor for Semiconductor Multilevel Metallization.  2022 ISPSA.  대한민국
  • (2021)  CF4/O2 plasma etching properties of low dielectric constant films deposited by plasma enhanced chemical vapor deposition using the tetrakis(trimethylsilyloxy)silane precursor..  ICMAP 2020.  대한민국
  • (2020)  Effect of Low-Frequency Plasma on Polymerized SiCOH Low-kFilms in 13.56 MHz and 370 kHz Dual-Frequency Inductively Coupled PlasmaSystemUsing the Octamethylcyclotetrasiloxane Precursor.  The 27th Korean Conference on Semiconductors.  대한민국
  • (2020)  Effects of Carrier Gas Flow Rate on Properties of SiCOH Low Dielectric Constant Films in Plasma Enhanced Chemical Vapor Deposition Process Using the Octamethylcyclotetrasiloxane Precursor.  The 27th Korean Conference on Semiconductors.  대한민국
  • (2020)  Characterization of reduced graphene oxide by controlling the reduction time and its application to BaTiO3 encapsulation in dielectric behavior.  The 6th MUJU INTERNATIONAL Winter School.  대한민국
  • (2020)  Dielectric behavior of cyanoethyl pullulan polymer composite composed of reduced graphene encapsulated ferroelectric barium titanate.  The 6th MUJU INTERNATIONAL Winter School.  대한민국
  • (2020)  Dielectric performance comparison between encapsulation and mixing of reduced graphene oxide with ferroelectric BaTiO3 and a polymer.  The 6th MUJU INTERNATIONAL Winter School.  대한민국
  • (2019)  Fabrication and Characterizations of Amine-functionalized PEG Thin Films by Using Plasma-Enhanced Chemical Vapor Deposition.  The 22nd International Conference on Secondary Ion Mass Spectrometry.  일본
  • (2019)  Effective Lifetime of P3HT/PCBM Bi-layer Organic Solar Cells with Carbon Nanotubes by Impedance Analysis.  International Forum on Functional Materials 2019.  대한민국
  • (2019)  Effects of He/H2 plasma treatment on properties of SiCOH films deposited with the 1,1,1,3,5,7,7,7-octamethyl-3,5-bis(trimethylsiloxy)tertrasiloxane precursor.  International Forum on Functional Materials.  대한민국
  • (2018)  Low dielectric constant plasma polymerized SiCOH film deposited from tetrakis(trimethylsilyoxy)silane as a flexible insulator.  The 7th International Conference on Microelecronics and Plasma Technology.  대한민국
  • (2018)  Plasma copolymerization of ultra-low dielectric constant SiCOH films using octamethylcyclotetrasiloxane and tetraethylorthosilicate precursors.  The 7th International Conference on Microelecronics and Plasma Technology.  대한민국
  • (2017)  초저유전상수 플라즈마 중합된 테트라키스(트리메틸실릴옥시)실란 박막.  반도체 디스플레이 공정, 장비 및 소재 신기술 동향.  대한민국
  • (2017)  Fabrication and characterization of amine functionalized plasma polymerized PEG film on 3D beads by using modified PE-CVD system.  NANO KOREA 2017.  대한민국
  • (2017)  Plasma surface modification for the enhanced adhesiveness of human umbilical vein endothelial cells on polystyrene petri dishes.  2017 International Forum on Functional Materials (IFFM2017).  대한민국
  • (2017)  Characteristics of deposition and etch selectivity of TiOx films deposited by PECVD from titanium isopropoxide precursor.  2017 International Forum on Functional Materials (IFFM2017).  대한민국
  • (2017)  Flexibilities of low-k films deposited by PECVD with the tetrakis(trimethylsilyloxy)silane precursor.  2017 International Forum on Functional Materials (IFFM2017).  대한민국